Ogee Sculpted Complexion Foundation Stick – Mahogany 14.5N Full Coverage with 70% Organic Ingredients for Rich Skin Tones

$52.00

Description

✨ Full Coverage Meets Clean Beauty

The Ogee Sculpted Complexion Foundation Stick (Mahogany 14.5N) is the perfect solution for those seeking full coverage foundation that feels light on the skin while enhancing natural beauty. Infused with 70% certified organic ingredients, this foundation stick offers a radiant finish that complements deep cocoa tones with rich undertones.

🌿 Clean Formula for Confident Skin

Formulated with pure mineral pigments, this complexion stick instantly evens out skin tone while allowing your natural glow to shine through. With its non-toxic, vegan, and cruelty-free profile, the formula contains no harsh chemicals, synthetic fragrances, parabens, phthalates, dyes, or petrochemicals—making it safe for all skin types, including sensitive skin.

💧 Skin-Loving Ingredients

The foundation does more than cover; it nourishes and hydrates. It’s enriched with Hyaluronic Acid, Collagen, and Elastin, which help plump the skin, reduce the appearance of fine lines, and support long-term skin health.

🎯 Customizable Coverage for Every Look

Whether you’re heading to work or a night out, this weightless stick foundation glides effortlessly onto the skin and blends beautifully. You can apply a single layer for a natural glow or build it up for full coverage. The breathable formula lets your skin feel fresh all day.

🖌 Pro Tip: Use With the Ogee Blender Brush

For a flawless finish, pair the foundation stick with Ogee’s soft Blender Brush. It seamlessly buffs the product into your skin for an airbrushed effect. Just search “Ogee makeup” to discover the complete luxury collection.

🛒 Shop Now on Amazon

👉 Buy Ogee Sculpted Complexion Foundation Stick (Mahogany 14.5N)

Reviews

There are no reviews yet.

Be the first to review “Ogee Sculpted Complexion Foundation Stick – Mahogany 14.5N Full Coverage with 70% Organic Ingredients for Rich Skin Tones”

Your email address will not be published. Required fields are marked *